Effect of hydrogen on electromigration and 1/fnoise in gold films
作者:
K. P. Rodbell,
P. J. Ficalora,
Roger Koch,
期刊:
Applied Physics Letters
(AIP Available online 1987)
卷期:
Volume 50,
issue 20
页码: 1415-1416
ISSN:0003-6951
年代: 1987
DOI:10.1063/1.97839
出版商: AIP
数据来源: AIP
摘要:
The 1/fnoise of polycrystalline gold films (5 &mgr;m wide and 0.5 &mgr;m thick) was found to decrease in the presence of hydrogen, to a level comparable with that in a single‐crystal gold film. Additionally, hydrogen was found to segregate to the metal‐substrate interface. On the basis of these results and recent evidence in the literature, we propose that hydrogen interacting with interface defects is responsible for both the observed 1/fnoise decrease and the previously reported electromigration enhancements.
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