Electron Tunneling between a Metal and a Semiconductor: Characteristics of Al‐Al2O3‐SnTe and −GeTe Junctions
作者:
L. L. Chang,
P. J. Stiles,
L. Esaki,
期刊:
Journal of Applied Physics
(AIP Available online 1967)
卷期:
Volume 38,
issue 11
页码: 4440-4445
ISSN:0021-8979
年代: 1967
DOI:10.1063/1.1709144
出版商: AIP
数据来源: AIP
摘要:
The process of electron tunneling from a metal to a semiconductor through an insulating layer is considered. Theoretical current‐voltage expressions have been obtained, in particular, for the case when the semiconductor is degenerateptype and the conduction band of the insulator provides the dominant tunneling barrier. The existence of an energy gap and a relatively small Fermi energy in the semiconductor makes the current highly asymmetrical with respect to the polarity of the applied voltage. Experimentally, junctions of Al‐Al2O3‐SnTe and −GeTe have been fabricated and theirI‐Vcharacteristics measured at 4.2°K. Good agreement is observed between the theoretical and experimental current behavior, from which energy parameters of the semiconductors and the barrier relations of the junctions have been obtained.
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