Boron, phosphorus, and arsenic diffusion in TiSi2
作者:
P. Gas,
V. Deline,
F. M. d‘Heurle,
A. Michel,
G. Scilla,
期刊:
Journal of Applied Physics
(AIP Available online 1986)
卷期:
Volume 60,
issue 5
页码: 1634-1639
ISSN:0021-8979
年代: 1986
DOI:10.1063/1.337252
出版商: AIP
数据来源: AIP
摘要:
The diffusivities of B, P, and As implanted in TiSi2are analyzed between 500 and 900 °C by secondary ion mass spectroscopy. It is shown that P and As have high (and almost equal) diffusivities compared with B which appears immobile. This difference is presumed to be related to the very high stability of TiB2(as compared with TiSi2) and the probable precipitation of B in the form of a titanium boride. The lattice diffusion coefficients for As and P are deduced from the diffusion profiles; they range from 10−17to 10−14cm2/s between 550 and 800 ° C. The activation energies are found to be, respectively, 1.8 and 2.0 eV; values close to the activation energy for the self‐diffusion of Si in TiSi2, 1.8 eV. The diffusion profiles also show a high grain boundary diffusivity and an accumulation of dopant at the TiSi2–Si interface.
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