Real‐time observation of molecular beam epitaxy growth on mesa‐etched GaAs substrates by scanning microprobe reflection high‐energy electron diffraction
作者:
M. Hata,
T. Isu,
A. Watanabe,
Y. Katayama,
期刊:
Applied Physics Letters
(AIP Available online 1990)
卷期:
Volume 56,
issue 25
页码: 2542-2544
ISSN:0003-6951
年代: 1990
DOI:10.1063/1.102881
出版商: AIP
数据来源: AIP
摘要:
Microscopic distribution of growth rates on mesa‐etched GaAs(001) wafers was measured in real time during molecular beam epitaxy growth by scanning microprobe reflection high‐energy electron diffraction. It has been observed that the growth rate on the GaAs(001) surface near the edge of (111)Asurfaces becomes larger. The exponential variation of the growth rate as a function of the distance from the edge reflects surface diffusion of Ga atoms. The diffusion length on the (001) surface is estimated to be about 1 &mgr;m at 560 °C. The relatively larger diffusion length suggests that the incorporation rate of migrating Ga atoms by steps is much smaller than unity.
点击下载:
PDF
(290KB)
返 回