Thermal stability of rapidly annealed indium tin oxide/n‐GaAs heterostructures
作者:
G. Eftekhari,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1995)
卷期:
Volume 13,
issue 4
页码: 1560-1562
ISSN:1071-1023
年代: 1995
DOI:10.1116/1.588187
出版商: American Vacuum Society
关键词: ITO LAYERS;GALLIUM ARSENIDES;N−TYPE CONDUCTORS;HETEROSTRUCTURES;ANNEALING;TEMPERATURE DEPENDENCE;TEMPERATURE RANGE 400−1000 K;ELECTRICAL PROPERTIES;TUNNEL EFFECT;DIFFUSION;THERMIONIC EMISSION;ITO;GaAs
数据来源: AIP
摘要:
The effects of rapid thermal annealing on the electrical properties of ITO/n‐GaAs are investigated. For as‐deposited contacts the current is dominated by recombination at low bias and by thermionic emission at high bias. Annealing at 500 °C for 20 s causes the current to be dominated by thermionic emission for all biases. Annealing at 600 and 700 °C degrades the contact properties. At 700 °C annealing temperature the current is dominated by tunneling. Removal of sputter generated defects at low annealing temperature, diffusion of indium and tin atoms into GaAs and formation of ann+InAs–InxGa1−xAs layer at higher annealing temperature are proposed as mechanisms to explain the observations.
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