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High‐energy argon‐ion implantation for waveguide formation in (AlGa)As/GaAs multilayers

 

作者: D. R. Myers,   Kyu Lee,   T. Hausken,   R. J. Simes,   H. Ribot,   F. Laruelle,   L. A. Coldren,  

 

期刊: Applied Physics Letters  (AIP Available online 1990)
卷期: Volume 57, issue 20  

页码: 2051-2053

 

ISSN:0003-6951

 

年代: 1990

 

DOI:10.1063/1.104115

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We have intermixed GaAs/(AlGa)As multiquantum structures for waveguides and lasers by 3 MeV Ar implantation and 850 °C, 30 min closed‐tube annealing. Buried‐heterostructure lasers defined by Ar mixing had threshold currents of 100 mA for 370‐&mgr;m‐long devices. As waveguides for 1.15 &mgr;m light, the devices exhibited losses of 25 cm−1in the annealed, implanted regions, and 15 cm−1in unimplanted regions defined by adjacent implants. Analysis of the results illustrates important considerations for implant mixing for waveguide formation.

 

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