High‐energy argon‐ion implantation for waveguide formation in (AlGa)As/GaAs multilayers
作者:
D. R. Myers,
Kyu Lee,
T. Hausken,
R. J. Simes,
H. Ribot,
F. Laruelle,
L. A. Coldren,
期刊:
Applied Physics Letters
(AIP Available online 1990)
卷期:
Volume 57,
issue 20
页码: 2051-2053
ISSN:0003-6951
年代: 1990
DOI:10.1063/1.104115
出版商: AIP
数据来源: AIP
摘要:
We have intermixed GaAs/(AlGa)As multiquantum structures for waveguides and lasers by 3 MeV Ar implantation and 850 °C, 30 min closed‐tube annealing. Buried‐heterostructure lasers defined by Ar mixing had threshold currents of 100 mA for 370‐&mgr;m‐long devices. As waveguides for 1.15 &mgr;m light, the devices exhibited losses of 25 cm−1in the annealed, implanted regions, and 15 cm−1in unimplanted regions defined by adjacent implants. Analysis of the results illustrates important considerations for implant mixing for waveguide formation.
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