Kinetics of strain relaxation through misfit dislocation formation in the growth of epitaxial films on compliant substrates
作者:
Dimitrios Maroudas,
Luis A. Zepeda-Ruiz,
W. Henry Weinberg,
期刊:
Applied Physics Letters
(AIP Available online 1998)
卷期:
Volume 73,
issue 6
页码: 753-755
ISSN:0003-6951
年代: 1998
DOI:10.1063/1.121990
出版商: AIP
数据来源: AIP
摘要:
A phenomenological mean-field theory is presented for the kinetics of strain relaxation due to misfit dislocation generation in the strained-layer growth of epitaxial semiconductor films on thin compliant substrates. The theory provides a generalized dislocation kinetic framework by coupling the mechanics of an epitaxial film on a compliant substrate with a well-known description of plastic deformation dynamics in semiconductor crystals. The theoretical results reproduce successfully recent experimental data for strain relaxation in the InAs/GaAs(110) heteroepitaxial system. ©1998 American Institute of Physics.
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