A hydrogenated amorphous silicon (a‐Si:H)p‐i‐nsolar cell with a two‐layer back electrode is proposed. The new type of back electrode consists of a conventional Al layer and an amorphous silicide layer. The properties of amorphous Cr‐silicide film and thermal stability ofa‐Si:Hp‐i‐nsolar cells with a two‐layer back electrode are studied. The experimental results show that an amorphous Cr‐silicide layer can prevent the thermal diffusion of Al from going intoa‐Si:H, and thus can improve the thermal stability of thea‐Si:H solar cell.