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Effects of monolayer coverages on substrate sputtering yields

 

作者: D.M. Gruen,   A.R. Krauss,   M.J. Pellin,  

 

期刊: Radiation Effects  （Taylor Available online 1985）
卷期: Volume 89, issue 1-2  

页码: 113-127

 

ISSN:0033-7579

 

年代: 1985

 

DOI:10.1080/00337578508220698

 

出版商: Taylor & Francis Group

 

数据来源: Taylor

 

摘要:

Materials currently being used or considered for plasma-side applications are not entirely satisfactory, particularly in the medium edge temperature (∼100–300 eV) regime. A new approach to impurity control based on self-sustaining surface segregated low-Z layers with high secondary ion fractions has been suggested and tested in laboratory experiments.

 

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