Effect of Pressure on Al&sngbnd;I&sngbnd;Bi Tunnel Junctions
作者:
J. R. Vaisnys,
D. B. McWhan,
J. M. Rowell,
期刊:
Journal of Applied Physics
(AIP Available online 1969)
卷期:
Volume 40,
issue 6
页码: 2623-2627
ISSN:0021-8979
年代: 1969
DOI:10.1063/1.1658044
出版商: AIP
数据来源: AIP
摘要:
Measurements of resistance (dV/dI) versus bias (V) have been made for Al&sngbnd;I&sngbnd;Bi junctions at 77°K up to pressures of 30 kbar. The junctions were prepared by evaporation upon freshly cleaved mica and the pressures generated in a girdle die using AgCl as the pressure transmitting medium. The results are reversible with pressure cycling. A conduction maximum occurs at ≈0.13 V and a kink at ≈−0.15 V. The maximum changes with pressure at a ratedV/dP=−1.7×10−6V/bar. A change in the tunneling curve is observed at the semimetal to semiconductor transition.
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