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Effect of Pressure on Al&sngbnd;I&sngbnd;Bi Tunnel Junctions

 

作者: J. R. Vaisnys,   D. B. McWhan,   J. M. Rowell,  

 

期刊: Journal of Applied Physics  (AIP Available online 1969)
卷期: Volume 40, issue 6  

页码: 2623-2627

 

ISSN:0021-8979

 

年代: 1969

 

DOI:10.1063/1.1658044

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Measurements of resistance (dV/dI) versus bias (V) have been made for Al&sngbnd;I&sngbnd;Bi junctions at 77°K up to pressures of 30 kbar. The junctions were prepared by evaporation upon freshly cleaved mica and the pressures generated in a girdle die using AgCl as the pressure transmitting medium. The results are reversible with pressure cycling. A conduction maximum occurs at ≈0.13 V and a kink at ≈−0.15 V. The maximum changes with pressure at a ratedV/dP=−1.7×10−6V/bar. A change in the tunneling curve is observed at the semimetal to semiconductor transition.

 

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