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Photoelectronic processes in high‐resistivity stannic oxide

 

作者: M. De Murcia,   J. Bonnafe,   J. C. Manifacier,   J. P. Fillard,  

 

期刊: Journal of Applied Physics  (AIP Available online 1978)
卷期: Volume 49, issue 3  

页码: 1177-1187

 

ISSN:0021-8979

 

年代: 1978

 

DOI:10.1063/1.324709

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Using Bube’s formulation of the sensitization process in photoconductors a particular exchange mechanism is proposed that associates a shallow trap (excited state) and a recombination level (fundamental state). Expressions are deduced describing the photocurrent behavior as a function of temperature and illumination on both sides of the continuous thermal quenching zone; explicit formulations are also deduced for the upper and lower break points in the lux‐ampere characteristics. Such a phenomenological model is applied to photoconduction data on stannic oxide high‐resistivity samples. Optical quenching and pulsed photoconductivity are also emphasized in order to propose a consistent scheme for the localized levels in the forbidden energy band. It is shown from this work that localized transitions occur between three possible recombination states and a common excited state working with the conduction band as a shallow trap; associated lifetimes are measured.

 

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