Photoelectronic processes in high‐resistivity stannic oxide
作者:
M. De Murcia,
J. Bonnafe,
J. C. Manifacier,
J. P. Fillard,
期刊:
Journal of Applied Physics
(AIP Available online 1978)
卷期:
Volume 49,
issue 3
页码: 1177-1187
ISSN:0021-8979
年代: 1978
DOI:10.1063/1.324709
出版商: AIP
数据来源: AIP
摘要:
Using Bube’s formulation of the sensitization process in photoconductors a particular exchange mechanism is proposed that associates a shallow trap (excited state) and a recombination level (fundamental state). Expressions are deduced describing the photocurrent behavior as a function of temperature and illumination on both sides of the continuous thermal quenching zone; explicit formulations are also deduced for the upper and lower break points in the lux‐ampere characteristics. Such a phenomenological model is applied to photoconduction data on stannic oxide high‐resistivity samples. Optical quenching and pulsed photoconductivity are also emphasized in order to propose a consistent scheme for the localized levels in the forbidden energy band. It is shown from this work that localized transitions occur between three possible recombination states and a common excited state working with the conduction band as a shallow trap; associated lifetimes are measured.
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