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A review of excimer laser projection lithography

 

作者: M. Rothschild,   D. J. Ehrlich,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena  （AIP Available online 1988）
卷期: Volume 6, issue 1  

页码: 1-17

 

ISSN:0734-211X

 

年代: 1988

 

DOI:10.1116/1.584004

 

出版商: American Vacuum Society

 

关键词: LITHOGRAPHY;REVIEWS;EXCIMER LASERS;MICROELECTRONICS;PHOTORESISTS;MATERIALS;RESOLUTION;MANUFACTURING;Si;resist;Al;GaAs;Cd;polyimide

 

数据来源: AIP

 

摘要:

Excimer‐laser projection lithography now appears to be in a position to extend production optical techniques to dimensions approaching 0.25 μm. Such methods could well be the basis for the bulk of the advanced manufacturing capability in microelectronics over the next decade. This technology is reviewed with an eye to the state of the art and to the optical‐, resist‐, and materials‐engineering issues that it presents.

 

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