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Effect of Operating Pressure on Plasma Formation in the Transient Hollow Cathode Discharge

 

作者: C. S. Wong,   C. X. Ong,   S. P. Moo,   P. Choi,  

 

期刊: AIP Conference Proceedings  (AIP Available online 1994)
卷期: Volume 299, issue 1  

页码: 637-642

 

ISSN:0094-243X

 

年代: 1994

 

DOI:10.1063/1.2949217

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The discharge development of a triggered pulsed hollow cathode discharge is investigated with respect to two regimes of operating pressure: the high pressure regime at ∼ 10−2mbar and the low pressure regime at ∼ 10−5mbar. The hollow cathode discharge studied here is performed with the UMFX device powered by either eight 2700 pF door‐knob capacitors connected in parallel and discharged at 40 kV or a single 1.85 &mgr;F capacitor discharged at 20 kV. The characteristics of the discharge is monitored by using magnetic probe for dI/dt measurement; PIN diodes and XRD for time‐resolved X‐ray signals; and pinhole camera for time‐integrated X‐ray imaging. At the high operating pressure regime, X‐rays are observed to be emitted from the tip of the anode only. At the low operating pressure regime, however, the heating of the plasma by the main capacitor discharge is significantly enhanced. In the case of low energy discharge (with 22 nF capacitor bank), a plume‐like plasma emitting in the soft X‐ray region is observed to be formed attached to the tip of the anode. The pre‐breakdown electron beam, which is a well‐known phenomenon in this type of discharge, is also observed to be significantly enhanced. For the case of discharges performed with the 1.85 &mgr;F capacitor, dense plasma spots are observed at low operating pressure of 10−4mbar or lower. These dense plasma spots are not observed for discharges operated at pressures higher than 10−4mbar

 

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