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Silicon cell for the precise measurement of thermal expansion at low temperatures: Results for Cu and NaF

 

作者: R. Villar,   M. Hortal,   S. Vieira,  

 

期刊: Review of Scientific Instruments  (AIP Available online 1980)
卷期: Volume 51, issue 1  

页码: 27-31

 

ISSN:0034-6748

 

年代: 1980

 

DOI:10.1063/1.1136050

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A three terminal capacitance dilatometer for low temperatures is reported in which the expansivity of a sample is compared to that of silicon, a material of very small expansivity at low temperatures. The thermal expansion of a standard copper sample is measured down to 3 K and the results compared with other authors. Values for the linear thermal expansion coefficient of a pure NaF single crystal below 5 K are reported for the first time.

 

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