Silicon cell for the precise measurement of thermal expansion at low temperatures: Results for Cu and NaF
作者:
R. Villar,
M. Hortal,
S. Vieira,
期刊:
Review of Scientific Instruments
(AIP Available online 1980)
卷期:
Volume 51,
issue 1
页码: 27-31
ISSN:0034-6748
年代: 1980
DOI:10.1063/1.1136050
出版商: AIP
数据来源: AIP
摘要:
A three terminal capacitance dilatometer for low temperatures is reported in which the expansivity of a sample is compared to that of silicon, a material of very small expansivity at low temperatures. The thermal expansion of a standard copper sample is measured down to 3 K and the results compared with other authors. Values for the linear thermal expansion coefficient of a pure NaF single crystal below 5 K are reported for the first time.
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