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Modeling delamination due to thermal stress in optical storage media

 

作者: M. A. Nkansah,   K. E. Evans,  

 

期刊: Journal of Applied Physics  (AIP Available online 1990)
卷期: Volume 67, issue 7  

页码: 3243-3248

 

ISSN:0021-8979

 

年代: 1990

 

DOI:10.1063/1.345356

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Finite element analysis is used to calculate the shape of blisters formed in bilayer optical storage media due to the buildup of thermal stresses during laser writing. It is shown that practically usable blisters may be expected to form in a time period of about 15 ns. Such a thermal stress delamination process may also precede melting in conventional pit formation processes.

 

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