Modeling delamination due to thermal stress in optical storage media
作者:
M. A. Nkansah,
K. E. Evans,
期刊:
Journal of Applied Physics
(AIP Available online 1990)
卷期:
Volume 67,
issue 7
页码: 3243-3248
ISSN:0021-8979
年代: 1990
DOI:10.1063/1.345356
出版商: AIP
数据来源: AIP
摘要:
Finite element analysis is used to calculate the shape of blisters formed in bilayer optical storage media due to the buildup of thermal stresses during laser writing. It is shown that practically usable blisters may be expected to form in a time period of about 15 ns. Such a thermal stress delamination process may also precede melting in conventional pit formation processes.
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