Properties of ultrahigh vacuum self‐implantation‐induced amorphous germanium
作者:
G. Peto,
J. Kanski,
G. Holmen,
期刊:
Applied Physics Letters
(AIP Available online 1989)
卷期:
Volume 55,
issue 7
页码: 692-693
ISSN:0003-6951
年代: 1989
DOI:10.1063/1.101824
出版商: AIP
数据来源: AIP
摘要:
Ge (111) was self‐implanted in ultrahigh vacuum to prepare an impurity‐free amorphous layer. The same extraordinary amorphous state of Ge was induced as that found earlier with121Sb+implantation in normal vacuum. This eliminates the possibility that this anomalousa‐Ge is impurity stabilized.
点击下载:
PDF
(203KB)
返 回