首页   按字顺浏览 期刊浏览 卷期浏览 Deposition of MoS2Films by Physical Sputtering and Their Lubrication Properties in Vacu...
Deposition of MoS2Films by Physical Sputtering and Their Lubrication Properties in Vacuum1

 

作者: T. Spalvins,  

 

期刊: A S L E Transactions  (Taylor Available online 1969)
卷期: Volume 12, issue 1  

页码: 36-43

 

ISSN:0569-8197

 

年代: 1969

 

DOI:10.1080/05698196908972244

 

出版商: Taylor & Francis Group

 

数据来源: Taylor

 

摘要:

Physical d-c sputtering of MoS2was used to apply MoS2films for as a solid lubricant on rotating and sliding components. This method does not utilize binders or burnishing. Friction experiments in vacuum (10−11torr) were conducted on these films (approx. 2000 Å thick). The coefficient of friction for these films were similar to the reported values for resin bonded films 0.03–0.08. The long endurance life of these films in friction experiments indicates good adherence. The good adherence results from cleanliness of the surface (etched) and the relatively high energies of the sputtered material on arrival at the surface. These sputtered MoS2films were consistent in regard to stoichiometry, adherence, thickness, and uniformity when the sputtering conditions were accurately controlled from run to run.Presented as an American Society of Lubrication Engineers paper at the ASME/ASLE Lubrication Conference held in Atlantic City. New Jersey, October 8–10, 1968.1Some of this information has been published as NASA TN D-4269.

 

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