Deposition of MoS2Films by Physical Sputtering and Their Lubrication Properties in Vacuum1
作者:
T. Spalvins,
期刊:
A S L E Transactions
(Taylor Available online 1969)
卷期:
Volume 12,
issue 1
页码: 36-43
ISSN:0569-8197
年代: 1969
DOI:10.1080/05698196908972244
出版商: Taylor & Francis Group
数据来源: Taylor
摘要:
Physical d-c sputtering of MoS2was used to apply MoS2films for as a solid lubricant on rotating and sliding components. This method does not utilize binders or burnishing. Friction experiments in vacuum (10−11torr) were conducted on these films (approx. 2000 Å thick). The coefficient of friction for these films were similar to the reported values for resin bonded films 0.03–0.08. The long endurance life of these films in friction experiments indicates good adherence. The good adherence results from cleanliness of the surface (etched) and the relatively high energies of the sputtered material on arrival at the surface. These sputtered MoS2films were consistent in regard to stoichiometry, adherence, thickness, and uniformity when the sputtering conditions were accurately controlled from run to run.Presented as an American Society of Lubrication Engineers paper at the ASME/ASLE Lubrication Conference held in Atlantic City. New Jersey, October 8–10, 1968.1Some of this information has been published as NASA TN D-4269.
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