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Band Structure of the Intermetallic Semiconductors from Pressure Experiments

 

作者: William Paul,  

 

期刊: Journal of Applied Physics  (AIP Available online 1961)
卷期: Volume 32, issue 10  

页码: 2082-2094

 

ISSN:0021-8979

 

年代: 1961

 

DOI:10.1063/1.1777022

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Three types of conduction band extrema in the (000), (100), and (111) directions inkspace seem to determine many of the properties of the group 4 and group 3–5 semiconductors. Early experimental work on the pressure coefficients of the energy separations of these extrema from the valence band maximum energy, carried out on Ge (111), (000), (100), Si (100), and InSb (000), suggested that the three pressure coefficients might be independent of the specific element or compound in the group 4 and group 3–5 series. This work is discussed in detail, and the theoretical basis is briefly considered. All of the completed pressure measurements on these compounds are critically reviewed, and the correlation of unique pressure coefficients with specific band edges examined. It is demonstrated that pressure experiments can be planned to show up details of the band structure unavailable for study at atmospheric pressure. Particular attention is paid to GaP, and a new model for excess absorption occurring inn‐type samples of this compound and in Si, GaAs, and AlSb is suggested. The application of similar techniques to PbS, PbSe, and PbTe is discussed, and results of electrical and optical measurements of energy gap and electron and hole mobilities presented.

 

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