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Vacuum‐ultraviolet‐induced space charge in Al2O3films

 

作者: R. J. Powell,  

 

期刊: Applied Physics Letters  (AIP Available online 1976)
卷期: Volume 28, issue 11  

页码: 643-645

 

ISSN:0003-6951

 

年代: 1976

 

DOI:10.1063/1.88607

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The spectral dependence of positive space charge induced in an Al‐Al2O3‐Si MOS structure shows a sharp threshold at 7.8±0.2 eV. This threshold is interpreted to be the onset of band‐to‐band transitions in Al2O3. The net space charge induced by 10.2‐eV radiation can be positive or negative depending on the bias polarity and magnitude. The voltage dependence is qualitatively explained by the competitive processes of electron‐hole pair generation and electron injection from the electrodes.

 

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