首页   按字顺浏览 期刊浏览 卷期浏览 Electron‐beam‐controlled discharge pumping of the XeF laser
Electron‐beam‐controlled discharge pumping of the XeF laser

 

作者: J. A. Mangano,   J. H. Jacob,   J. B. Dodge,  

 

期刊: Applied Physics Letters  (AIP Available online 1976)
卷期: Volume 29, issue 7  

页码: 426-428

 

ISSN:0003-6951

 

年代: 1976

 

DOI:10.1063/1.89106

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Laser action of XeF has been obtained in atmospheric‐pressure mixtures of 0.1% NF3, 0.4% Xe, and 99.5% Ar with electron‐beam‐controlled discharge pumping. The mean discharge current and voltage were 75 A/cm2and 11 kV/cm, respectively, at 4 atm total pressure. The high‐energy E‐beam current was 12 A/cm2. Mechanisms for creating XeF* in a discharge are discussed. Physical processes which limit the intrinsic efficiency to 0.3% in the present device are also discussed.

 

点击下载:  PDF (238KB)



返 回