Electron‐beam‐controlled discharge pumping of the XeF laser
作者:
J. A. Mangano,
J. H. Jacob,
J. B. Dodge,
期刊:
Applied Physics Letters
(AIP Available online 1976)
卷期:
Volume 29,
issue 7
页码: 426-428
ISSN:0003-6951
年代: 1976
DOI:10.1063/1.89106
出版商: AIP
数据来源: AIP
摘要:
Laser action of XeF has been obtained in atmospheric‐pressure mixtures of 0.1% NF3, 0.4% Xe, and 99.5% Ar with electron‐beam‐controlled discharge pumping. The mean discharge current and voltage were 75 A/cm2and 11 kV/cm, respectively, at 4 atm total pressure. The high‐energy E‐beam current was 12 A/cm2. Mechanisms for creating XeF* in a discharge are discussed. Physical processes which limit the intrinsic efficiency to 0.3% in the present device are also discussed.
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