首页   按字顺浏览 期刊浏览 卷期浏览 The oxidation of GaAs(110): A reevaluation
The oxidation of GaAs(110): A reevaluation

 

作者: G. Landgren,   R. Ludeke,   Y. Jugnet,   J. F. Morar,   F. J. Himpsel,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena  (AIP Available online 1984)
卷期: Volume 2, issue 3  

页码: 351-358

 

ISSN:0734-211X

 

年代: 1984

 

DOI:10.1116/1.582823

 

出版商: American Vacuum Society

 

关键词: OXIDATION;GALLIUM ARSENIDES;PHOTOEMISSION;CORE LEVELS;FERMI LEVEL;PHOTOELECTRON SPECTROSCOPY;SYNCHROTRON RADIATION

 

数据来源: AIP

 

摘要:

Photoemission spectra of 3dcore levels excited with synchrotron radiation reveal a multicomponent substructure which increases in complexity with oxygen exposures over the range 106–1014L (langmuir). Spectral changes are already evident for Ga at 104L, and for As near 106L. Two oxide components shifted by 0.45 and 1 eV relative to the bulk Ga‐3dcore level are evident throughout the exposure range, but shift to 0.8 and 1.4 eV for 1014L. With increasing exposure the As‐3dcore level develops a sequential set of shifted components at 0.8, 2.3, 3.2, and 4.2 eV relative to the bulk position in GaAs, which are attributed to single through fourfold coordinated bond formation to oxygen. Both surface and bulk‐sensitive core spectra reveal a nearly equally intense oxide substructure, which indicates that contrary to previous notions subsurface oxidation is the dominant mechanism throughout the exposure range. The core spectra furthermore indicate preferential Ga oxidation—which suggests that separate Ga and As oxide phases form. Thus the oxidation of GaAs(110) is both spatially and chemically inhomogeneous. Changes in the position of the Fermi energy at the surface correlate well with the initial oxidation of surface sites and the onset of subsurface oxidation near 106L. A final pinning position of the Fermi energy was not observed.

 

点击下载:  PDF (628KB)



返 回