Soft magnetic Fe‐Al‐N/Si‐N multilayered film with high thermal stability
作者:
K. Katori,
K. Hayashi,
M. Hayakawa,
K. Aso,
期刊:
Applied Physics Letters
(AIP Available online 1989)
卷期:
Volume 54,
issue 12
页码: 1181-1182
ISSN:0003-6951
年代: 1989
DOI:10.1063/1.101561
出版商: AIP
数据来源: AIP
摘要:
An attempt to obtain soft magnetic materials with high saturation magnetic flux density and thermal stability has been carried out with respect to a multilayered type of films containing Fe‐N prepared by two‐source magnetron rf sputtering. The addition of small amounts of elements such as Al is effective in improving soft magnetic properties of Fe‐N films. Multilayered films of Fe‐Al‐N intervened by thin Si‐N layers showed softer magnetic properties than the Fe‐Al‐N single layer films and also showed high thermal stability. Typically, Fe‐Al‐N (500 A˚)/Si‐N (12 A˚) multilayered films exhibited a saturation magnetic flux density of 20 kG, a coercivityHcof 0.3 Oe, and a permeability &mgr; of 1900 at 5 MHz after annealing at 550 °C for 1 h.
点击下载:
PDF
(206KB)
返 回