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Soft magnetic Fe‐Al‐N/Si‐N multilayered film with high thermal stability

 

作者: K. Katori,   K. Hayashi,   M. Hayakawa,   K. Aso,  

 

期刊: Applied Physics Letters  (AIP Available online 1989)
卷期: Volume 54, issue 12  

页码: 1181-1182

 

ISSN:0003-6951

 

年代: 1989

 

DOI:10.1063/1.101561

 

出版商: AIP

 

数据来源: AIP

 

摘要:

An attempt to obtain soft magnetic materials with high saturation magnetic flux density and thermal stability has been carried out with respect to a multilayered type of films containing Fe‐N prepared by two‐source magnetron rf sputtering. The addition of small amounts of elements such as Al is effective in improving soft magnetic properties of Fe‐N films. Multilayered films of Fe‐Al‐N intervened by thin Si‐N layers showed softer magnetic properties than the Fe‐Al‐N single layer films and also showed high thermal stability. Typically, Fe‐Al‐N (500 A˚)/Si‐N (12 A˚) multilayered films exhibited a saturation magnetic flux density of 20 kG, a coercivityHcof 0.3 Oe, and a permeability &mgr; of 1900 at 5 MHz after annealing at 550 °C for 1 h.

 

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