Pulsed laser deposition (PLD) of oriented bismuth titanate films for integrated electronic applications
作者:
H. Buhay,
S. Sinharoy,
M.H. Francombe,
W.H. Kasner,
J. Talvacchio,
B.K. Park,
N.J. Doyle,
D.R. Lampe,
M. Polinsky,
期刊:
Integrated Ferroelectrics
(Taylor Available online 1992)
卷期:
Volume 1,
issue 2-4
页码: 213-222
ISSN:1058-4587
年代: 1992
DOI:10.1080/10584589208215713
出版商: Taylor & Francis Group
数据来源: Taylor
摘要:
In this paper we describe recent successes of growth of epitaxial bismuth titanate (BTO) films by pulsed laser deposition (PLD) suitable for electro-optic and electrical switching device structures, and fabrication of an improved gate structure for a ferroelectric memory FET (FEMFET). TEM and x-ray results indicate that excellent crystalline quality BTO films were achieved on LaAlO3. Polarization switching was demonstrated for BTO capacitors with epitaxial superconducting YBa2Cu3O7as the lower electrode. Using an SiO2buffer layer, a BTO/Si structure was fabricated and direct charge modulation in the Si by polarization reversal in the BTO was demonstrated.
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