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Pulsed laser deposition (PLD) of oriented bismuth titanate films for integrated electronic applications

 

作者: H. Buhay,   S. Sinharoy,   M.H. Francombe,   W.H. Kasner,   J. Talvacchio,   B.K. Park,   N.J. Doyle,   D.R. Lampe,   M. Polinsky,  

 

期刊: Integrated Ferroelectrics  (Taylor Available online 1992)
卷期: Volume 1, issue 2-4  

页码: 213-222

 

ISSN:1058-4587

 

年代: 1992

 

DOI:10.1080/10584589208215713

 

出版商: Taylor & Francis Group

 

数据来源: Taylor

 

摘要:

In this paper we describe recent successes of growth of epitaxial bismuth titanate (BTO) films by pulsed laser deposition (PLD) suitable for electro-optic and electrical switching device structures, and fabrication of an improved gate structure for a ferroelectric memory FET (FEMFET). TEM and x-ray results indicate that excellent crystalline quality BTO films were achieved on LaAlO3. Polarization switching was demonstrated for BTO capacitors with epitaxial superconducting YBa2Cu3O7as the lower electrode. Using an SiO2buffer layer, a BTO/Si structure was fabricated and direct charge modulation in the Si by polarization reversal in the BTO was demonstrated.

 

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