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Threshold oscillation of an NF(a1&Dgr;)/BiF visible wavelength chemical laser

 

作者: D. J. Benard,  

 

期刊: Journal of Applied Physics  (AIP Available online 1993)
卷期: Volume 74, issue 4  

页码: 2900-2907

 

ISSN:0021-8979

 

年代: 1993

 

DOI:10.1063/1.354645

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A novel shock tube reactor was used to pulse heat a gaseous mixture of He, FN3, and Bi(CH3)3along a 40 cm optical path between two highly reflective mirrors. Production of NF(a1&Dgr;) by dissociation of the azide was found to occur in a ‘‘delayed avalanche’’ approximately 50 &mgr;s after shock reflection, and weak lasing at 470 nm was observed that is assignable to electronic transitions in the BiF(A–X, &Dgr;v=3) band.

 

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