Optical monitoring for rate and uniformity control of low power plasma‐enhanced CVD
作者:
W. C. Dautremont‐Smith,
J. Lopata,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena
(AIP Available online 1983)
卷期:
Volume 1,
issue 4
页码: 943-946
ISSN:0734-211X
年代: 1983
DOI:10.1116/1.582716
出版商: American Vacuum Society
关键词: plasma;chemical vapor deposition;etching;sensitivity;silica;argon ions;silicon compounds;nitrous oxide;visible spectra;visible radiation;emission;near infrared radiation;emissivity;argon;silicon;hydrogen
数据来源: AIP
摘要:
Plasma‐enhanced CVD requires close control of the plasma power density for reproducibility of both deposition rate and spatial uniformity in a radial‐flow reactor. Frequently the low rf power levels needed are not adequately controlled by the output power control of the relatively high power rf generator found in most commercial multipurpose plasma etch/deposition systems. This paper describes very simple and inexpensive broadband optical monitoring of the plasma emission for improved control sensitivity. The technique has the advantage of directly monitoring the plasma intensity, avoiding effects of variable power transmission losses between the rf generator and the plasma. Application to the control of low power plasma‐enhanced CVD of ‘‘SiO2’’ from Ar:SiH4:N2O plasmas, where the monitor signal is almost entirely due to near infrared Ar emission, is described.
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