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Development of Metrology at NIST for the Semiconductor Industry

 

作者: Stephen Knight,  

 

期刊: AIP Conference Proceedings  (AIP Available online 1903)
卷期: Volume 683, issue 1  

页码: 97-104

 

ISSN:0094-243X

 

年代: 1903

 

DOI:10.1063/1.1622456

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The National Institute of Standards and Technology metrology development for the semiconductor industry and its supporting infrastructure is a broad set of programs directed at many of the critical metrology needs. This paper will give examples of specific projects addressing needs in lithography, critical dimension and overlay, gate dielectric characterization, interconnect materials, and manufacturing support. The paper will emphasize the role collaboration with industry plays in project selection, project success, and transfer to industry. © 2003 American Institute of Physics

 

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