Fourth power law of time dependence of Si adsorbate diffusion on a Si(001) surface
作者:
Takahisa Doi,
Masakazu Ichikawa,
Shigeyuki Hosoki,
期刊:
Applied Physics Letters
(AIP Available online 1997)
卷期:
Volume 71,
issue 14
页码: 1993-1995
ISSN:0003-6951
年代: 1997
DOI:10.1063/1.119765
出版商: AIP
数据来源: AIP
摘要:
Diffusion of Si adsorbates deposited on a Si(001) surface is investigated by reflection electron microscopy. At temperatures up to about 600 °C, the diffused lengthxof the adsorbates is proportional tot1/4before the critical timetc,wheretis the heating time. Att<tc,xis determined by a length at which atoms collide with others on the surface. Att>tc,the diffused lengthxis proportional tot1/2,wherexis determined by thermal diffusion of the adsorbates. ©1997 American Institute of Physics.
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