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Fourth power law of time dependence of Si adsorbate diffusion on a Si(001) surface

 

作者: Takahisa Doi,   Masakazu Ichikawa,   Shigeyuki Hosoki,  

 

期刊: Applied Physics Letters  (AIP Available online 1997)
卷期: Volume 71, issue 14  

页码: 1993-1995

 

ISSN:0003-6951

 

年代: 1997

 

DOI:10.1063/1.119765

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Diffusion of Si adsorbates deposited on a Si(001) surface is investigated by reflection electron microscopy. At temperatures up to about 600 °C, the diffused lengthxof the adsorbates is proportional tot1/4before the critical timetc,wheretis the heating time. Att<tc,xis determined by a length at which atoms collide with others on the surface. Att>tc,the diffused lengthxis proportional tot1/2,wherexis determined by thermal diffusion of the adsorbates. ©1997 American Institute of Physics.

 

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