Deposition of high quality a-Si films by an innovative “Hot Wire” CVD technique
作者:
Jianping Xi,
Scott Morrison,
Ken Coates,
Arun Madan,
期刊:
AIP Conference Proceedings
(AIP Available online 1999)
卷期:
Volume 462,
issue 1
页码: 266-271
ISSN:0094-243X
年代: 1999
DOI:10.1063/1.57903
出版商: AIP
数据来源: AIP
摘要:
For the “Hot Wire” chemical vapor deposition (HWCVD) method to be applicable for photovoltaic applications certain critical technical issues need to be addressed and resolved such as, lifetime of the filaments used, reproducibility, large area demonstration of the material and stable devices. We have developed a new approach which addresses some of these problems, specifically longevity of the filaments and reproducibility of the materials produced. This new technique does not seem to introduce contaminants into the materials from the source and can produce high quality amorphous Silicon (intrinsic and doped) and intrinsic microcrystalline silicon films. ©1999 American Institute of Physics.
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