Kinetics of silicon‐induced mixing of AlAs‐GaAs superlattices
作者:
P. Mei,
H. W. Yoon,
T. Venkatesan,
S. A. Schwarz,
J. P. Harbison,
期刊:
Applied Physics Letters
(AIP Available online 1987)
卷期:
Volume 50,
issue 25
页码: 1823-1825
ISSN:0003-6951
年代: 1987
DOI:10.1063/1.97709
出版商: AIP
数据来源: AIP
摘要:
The intermixing of AlAs‐GaAs superlattices has been investigated as a function of Si concentration following anneals in the range of 500 to 900 °C. The superlattice samples were grown by molecular beam epitaxy and the near surface layers were doped with silicon at concentrations of 2×1017to 5×1018cm−3. Si and Al depth profiles were measured with secondary ion mass spectrometry (SIMS). The diffusion length and activation energy of Al as a function of silicon dopant concentration were derived from the SIMS data. In the temperature range studied a single activation energy for the Al diffusion of ∼4 eV was observed, and the Al diffusion coefficients increased rapidly with Si concentration.
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