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Adsorption of type III and V elements on GaAs (110)

 

作者: J. van Laar,   A. Huijser,   T. L. van Rooy,  

 

期刊: Journal of Vacuum Science and Technology  (AIP Available online 1979)
卷期: Volume 16, issue 5  

页码: 1164-1167

 

ISSN:0022-5355

 

年代: 1979

 

DOI:10.1116/1.570182

 

出版商: American Vacuum Society

 

关键词: GALLIUM ARSENIDES;SURFACES;INDIUM;NITROGEN;PHOSPHORUS;ARSENIC;ADSORPTION;PHOTOEMISSION;ELECTRON SPECTROSCOPY;LCAO METHOD;FERMI LEVEL;AUGER ELECTRON SPECTROSCOPY

 

数据来源: AIP

 

摘要:

Angular‐resolved photoemission and low energy electron loss spectroscopy (LELS) measurements are reported on GaAs(110) surfaces with adsorbed In, N, P, and As. It is shown that the photoemission from the ’’As dangling bond’’ surface state vanished after In adsorption, whereas the surface photoemission is unaffected by deposition of N, P, or As. This result is confirmed by tight‐binding‐type surface band structure calculations for models with a relaxed GaAs surface on which adsorbed In is assumed to be bound to the surface As atoms and N, P, or As to the Ga. However, some other observations like the surface Fermi level position and the behavior of the Ga 3dexciton peak in the LELS spectrum cannot be understood from this model.

 

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