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Enhanced deposition rate of lithium phosphorus oxynitride thin films by sputtering of Li3PO4in N2–He gas mixtures

 

作者: J. B. Bates,   Xiaohua Yu,  

 

期刊: Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films  （AIP Available online 1996）
卷期: Volume 14, issue 1  

页码: 34-37

 

ISSN:0734-2101

 

年代: 1996

 

DOI:10.1116/1.579876

 

出版商: American Vacuum Society

 

关键词: DEPOSITION;HELIUM;HIGH−FREQUENCY DISCHARGES;HYDROGEN;IONIC CONDUCTIVITY;LITHIUM COMPOUNDS;NITRIDES;OXIDES;PHOSPHORUS COMPOUNDS;SPUTTERING;THIN FILMS;Li3PO4;Li2.9PO3.3N0.46

 

数据来源: AIP

 

摘要:

The addition of He to N2increases significantly the deposition rate of lithium phosphorus oxynitride thin films by radio frequency magnetron sputtering of Li3PO4targets. From the correlation with the optical emission intensity, the enhanced rate is attributed to an increase in the N+2ion concentration in the plasma due to Penning ionization. The ionic conductivity of the films deposited at higher rates in He+20% N2compares favorably with that of films deposited at lower rates in pure N2.

 

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