Ellipsometric investigation of vanadium dioxide films
作者:
J. T. Swann,
D. J. De Smet,
期刊:
Journal of Applied Physics
(AIP Available online 1985)
卷期:
Volume 58,
issue 3
页码: 1335-1338
ISSN:0021-8979
年代: 1985
DOI:10.1063/1.336103
出版商: AIP
数据来源: AIP
摘要:
Vanadium dioxide undergoes a transition at about 68 °C where the physical properties of the oxide, in particular the index of refraction and possibly the density, abruptly change values. In this work the indices of refraction of thermally grown films of vanadium dioxide on a vanadium substrate have been determined at room temperature and at 84 °C using the technique of ellipsometry. The index of refraction found for these films in this work is 2.82–0.317iat room temperature and 2.24–0.456iat 84 °C. In addition, our results indicate that there is a small increase in the thickness of each film upon heating through the transition.
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