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Updated system model for x‐ray lithography

 

作者: M. Khan,   L. Mohammad,   J. Xiao,   L. Ocola,   F. Cerrina,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena  （AIP Available online 1994）
卷期: Volume 12, issue 6  

页码: 3930-3935

 

ISSN:1071-1023

 

年代: 1994

 

DOI:10.1116/1.587577

 

出版商: American Vacuum Society

 

关键词: LITHOGRAPHY;X RADIATION;SIMULATION;SYNCHROTRON RADIATION;IMAGE FORMING;PHOTOEMISSION;SPATIAL RESOLUTION;WINDOWS;BERYLLIUM

 

数据来源: AIP

 

摘要:

We present an updated global model for x‐ray lithography based on realistic models for image formation, demonstrating how the extendibility of x‐ray lithography is well in the nanometer range. We apply these models to define the most convenient spectral range for x‐ray lithography manufacturing and the parameters of mirrors and filters to be used in an optimized beam line.

 

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