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Sputtered TaXfilm properties for x‐ray mask absorbers

 

作者: Takuya Yoshihara,   Setsu Kotsuji,   Katsumi Suzuki,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena  （AIP Available online 1996）
卷期: Volume 14, issue 6  

页码: 4363-4365

 

ISSN:1071-1023

 

年代: 1996

 

DOI:10.1116/1.589054

 

出版商: American Vacuum Society

 

关键词: FILMS;BINARY ALLOY SYSTEMS;TANTALUM ALLOYS;GERMANIUM ALLOYS;SILICON ALLOYS;RHENIUM ALLOYS;TITANIUM ALLOYS;MASKING;SPUTTERING;PHYSICAL PROPERTIES;CRYSTAL STRUCTURE;ETCHING;ABSORPTIVITY;X RADIATION;RESIDUAL STRESSES;(Ta,Ge);(Ta,Si);(Ta,Re);(Ta,Ti)

 

数据来源: AIP

 

摘要:

The characteristics of several elements for binary tantalum alloys, such as crystal structure, x‐ray absorption, and dry‐etching properties were systematically investigated. As a result, TaGe, TaSi, TaRe, and TaTi were selected as potential candidates for x‐ray mask absorbers. We deposited these Ta alloys using conventional magnetron sputtering. The stress in the TaXfilms was controlled more precisely than in Ta films. It was found that TaGe was one of the most suitable materials based on x‐ray absorption, stress control, and fine pattern fabrication.

 

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