Molecular beam epitaxy growth of MgZnSSe/ZnSSe Bragg mirrors controlled byin situoptical reflectometry
作者:
P. Uusimaa,
K. Rakennus,
A. Salokatve,
M. Pessa,
T. Aherne,
J. P. Doran,
J. O’Gorman,
J. Hegarty,
期刊:
Applied Physics Letters
(AIP Available online 1995)
卷期:
Volume 67,
issue 15
页码: 2197-2199
ISSN:0003-6951
年代: 1995
DOI:10.1063/1.115101
出版商: AIP
数据来源: AIP
摘要:
Insituoptical reflectometry at the wavelength of 488 nm was employed to control the growth of MgZnSSe/ZnSSe Bragg mirror stacks for the blue‐green spectral region. 10‐ and 20‐period layer structures of MgZnSSe/ZnSSe were grown on GaAs (100) epilayers by molecular beam epitaxy. A room‐temperature peak reflectance of 86% was obtained for the 20‐period structure at the central wavelength of 474 nm. The results show that, in general,insituoptical monitoring of growth is a viable and simple method for real‐time layer thickness control of MgZnSSe/ZnSSe quarter‐wave stacks. ©1995 American Institute of Physics.
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