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Molecular beam epitaxy growth of MgZnSSe/ZnSSe Bragg mirrors controlled byin situoptical reflectometry

 

作者: P. Uusimaa,   K. Rakennus,   A. Salokatve,   M. Pessa,   T. Aherne,   J. P. Doran,   J. O’Gorman,   J. Hegarty,  

 

期刊: Applied Physics Letters  (AIP Available online 1995)
卷期: Volume 67, issue 15  

页码: 2197-2199

 

ISSN:0003-6951

 

年代: 1995

 

DOI:10.1063/1.115101

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Insituoptical reflectometry at the wavelength of 488 nm was employed to control the growth of MgZnSSe/ZnSSe Bragg mirror stacks for the blue‐green spectral region. 10‐ and 20‐period layer structures of MgZnSSe/ZnSSe were grown on GaAs (100) epilayers by molecular beam epitaxy. A room‐temperature peak reflectance of 86% was obtained for the 20‐period structure at the central wavelength of 474 nm. The results show that, in general,insituoptical monitoring of growth is a viable and simple method for real‐time layer thickness control of MgZnSSe/ZnSSe quarter‐wave stacks. ©1995 American Institute of Physics.

 

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