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Synchrotron radiation stepper with new alignment system

 

作者: F. Sato,   K. Ito,   T. Miyatake,   K. Yamazaki,   S. Hamada,   Y. Tomita,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena  （AIP Available online 1992）
卷期: Volume 10, issue 6  

页码: 3235-3238

 

ISSN:1071-1023

 

年代: 1992

 

DOI:10.1116/1.585920

 

出版商: American Vacuum Society

 

关键词: LITHOGRAPHY;SYNCHROTRON RADIATION;X RADIATION;SPATIAL RESOLUTION;ALIGNMENT;WAFERS

 

数据来源: AIP

 

摘要:

A vertical stepper for synchrotron radiation (SR) x‐ray lithography has been developed. Evaluation tests have been done with SR light from the superconducting compact synchrotron ‘‘AURORA’’ located in SHI‐Tanashi Works, Tokyo. An overlay accuracy of less than 0.08 μm was obtained. A 0.2 μm line‐and‐space pattern was successfully resolved with a high‐aspect ratio. The designed specifications have been attained. The system is ready for the future generation ultra‐large‐scale integration applications.

 

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