Application of a toroidal plasma source to TiN thin film deposition
作者:
B. C. Zhang,
R. C. Cross,
期刊:
Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films
(AIP Available online 1998)
卷期:
Volume 16,
issue 4
页码: 2016-2020
ISSN:0734-2101
年代: 1998
DOI:10.1116/1.581304
出版商: American Vacuum Society
关键词: TiN
数据来源: AIP
摘要:
A toroidal plasma source for plasma deposition at the University of Sydney (PLADEPUS) has been developed for studies of deposition of thin films, such as titanium nitride (TiN). This article describes measurements of the plasma parameters at a low rf power input, the experimental setup of the preliminary thin film deposition and the method of titanium (Ti) atom injection into the plasma by using a small current Ti arc. The microstructure of the TiN thin films is analyzed and the results are presented.
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