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Formation of negative hydrogen ions on a cesiated W(110) surface; the influence of hydrogen implantation

 

作者: P. W. van Amersfoort,   J. J. C. Geerlings,   L. F. Tz. Kwakman,   A. Hershcovitch,   E. H. A. Granneman,   J. Los,  

 

期刊: Journal of Applied Physics  (AIP Available online 1985)
卷期: Volume 58, issue 9  

页码: 3566-3572

 

ISSN:0021-8979

 

年代: 1985

 

DOI:10.1063/1.335732

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The negative hydrogen ion formation process on a cesiated W(110) surface is studied by scattering a proton beam from such a surface. The primary energy ranges from 50 to 3000 eV. The angle of incidence with respect to the surface normal is 45° or 70°. A maximum negative‐ion formation probability of 0.67 is measured. This quantity does not depend on the angle of incidence. However, it is strongly influenced by the time the surface has been exposed to the beam. This effect is attributed to hydrogen implantation.

 

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