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Photosensitive systems for microlithography based on organometallic photoinitiators

 

作者: J. Finter,   M. Riediker,   B. Rotzinger,   O. Rohde,  

 

期刊: Makromolekulare Chemie. Macromolecular Symposia  （WILEY Available online 1989）
卷期: Volume 24, issue 1  

页码: 177-187

 

ISSN:0258-0322

 

年代: 1989

 

DOI:10.1002/masy.19890240118

 

出版商: Hüthig&Wepf Verlag

 

数据来源: WILEY

 

摘要:

AbstractThe photodecomposition of the Ar‐laser sensitive photo‐initiator bis(pentafluorophenyl)titanocene 1 was investigated. Two intermediate species were postulated: a pentafluorophenylcyclopentenyl radical 16 which acts as quencher and a ketene acetal radical of the structure CH2‐CH=C(OCH3)OTiRx17 which could initiate the polymeriz

 

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