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High‐temperature diamondp‐njunction: B‐doped homoepitaxial layer on N‐doped substrate

 

作者: T. H. Borst,   S. Strobel,   O. Weis,  

 

期刊: Applied Physics Letters  (AIP Available online 1995)
卷期: Volume 67, issue 18  

页码: 2651-2653

 

ISSN:0003-6951

 

年代: 1995

 

DOI:10.1063/1.114325

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Boron‐doped homoepitaxial layers have been selectively grown on synthetic type Ib substrates of (100) cut. Ohmic contacts were formed by evaporating a Mo/Pt/Au sandwich and subsequent annealing at 950°C for h. Current–voltage characteristics of diode type could be taken in vacuum in the temperature range 360–900 °C. Green light emission due to electroluminescence was observed from the junction area showing a maximum at a wavelength of 534 nm corresponding to a photon energy of 2.32 eV. The normalized emission spectrum was measured over the temperature range 320–440 °C with the device in air and was found independent of temperature and boron concentration. ©1995 American Institute of Physics.

 

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