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Magnetron sputtering system equipped with a versatile substrate table

 

作者: H. A. Huggins,   M. Gurvitch,  

 

期刊: Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films  （AIP Available online 1983）
卷期: Volume 1, issue 1  

页码: 77-80

 

ISSN:0734-2101

 

年代: 1983

 

DOI:10.1116/1.572314

 

出版商: American Vacuum Society

 

关键词: fabrication;thin films;aluminium;niobium;sputtering;magnetrons;design;deposition;surface coating;rotation;junctions;coatings

 

数据来源: AIP

 

摘要:

A three target dc magnetron sputtering system has been constructed. The main feature of the system is a unique rotating substrate table which permits deposition onto continuously heated or cooled substrates while they are rotating. With this setup, Nb‐based tunnel junctions with thin Al overlayers, multilayered materials, and a variety of alloys have been prepared.

 

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