首页   按字顺浏览 期刊浏览 卷期浏览 Automatic measurement of thickness as applied to germanium wafer production in transist...
Automatic measurement of thickness as applied to germanium wafer production in transistor manufacture

 

作者: C.E.Bicknell,  

 

期刊: Proceedings of the IEE - Part B: Electronic and Communication Engineering  (IET Available online 1959)
卷期: Volume 106, issue 17S  

页码: 1171-1175

 

年代: 1959

 

DOI:10.1049/pi-b-2.1959.0213

 

出版商: IEE

 

数据来源: IET

 

摘要:

The paper first examines the problems involved in the measurement of the thickness of germanium wafers, the difficulties encountered in handling and manoeuvring them due to their small size and weight and the nature of their material composition. Errors and failings in hand measurement are discussed, together with the advantages of mechanical measurement.The design and construction of an automatic measuring machine are then described, showing how the wafers are measured, sorted into seven different sizes and counted. The movement of them to the measuring point is by mechanical means, but they are measured, sorted and counted electronically. Measurement is effected by an electronic comparator of high magnification and accuracy, the output signal of which is amplified and then used to operate the sorting mechanism.Some half-million wafers were measured during the development period, which is described, together with the difficulties encountered and the modifications found necessary finally to produce the consistency and accuracy of measurement required.In conclusion, the assets of the machine in eliminating human error in hand measurement and operator fatigue, together with its production capacity, are described.

 

点击下载:  PDF (628KB)



返 回