XeF laser characteristics studied at elevated temperatures
作者:
W. E. Ernst,
F. K. Tittel,
期刊:
Journal of Applied Physics
(AIP Available online 1980)
卷期:
Volume 51,
issue 5
页码: 2432-2435
ISSN:0021-8979
年代: 1980
DOI:10.1063/1.328013
出版商: AIP
数据来源: AIP
摘要:
The electron‐beam‐pumped XeF laser operating on theB‐XandC‐Atransitions shows a strong temperature dependence. Fluorescence, gain, and laser output measurements in Ar/Xe/NF3and Ne/Xe/NF3mixtures are reported for temperatures from 300 to 600 K. Elevated temperatures cause stronger mixing between theBandCstates as well as among the vibrational levels within theBstate. Together with the higher ground‐state dissociation rate this leads to an improvement of theB‐Xlasing for 300k <T< 500 K, whereas theC‐Alaser emission ceases under these conditions.
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