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XeF laser characteristics studied at elevated temperatures

 

作者: W. E. Ernst,   F. K. Tittel,  

 

期刊: Journal of Applied Physics  (AIP Available online 1980)
卷期: Volume 51, issue 5  

页码: 2432-2435

 

ISSN:0021-8979

 

年代: 1980

 

DOI:10.1063/1.328013

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The electron‐beam‐pumped XeF laser operating on theB‐XandC‐Atransitions shows a strong temperature dependence. Fluorescence, gain, and laser output measurements in Ar/Xe/NF3and Ne/Xe/NF3mixtures are reported for temperatures from 300 to 600 K. Elevated temperatures cause stronger mixing between theBandCstates as well as among the vibrational levels within theBstate. Together with the higher ground‐state dissociation rate this leads to an improvement of theB‐Xlasing for 300k <T< 500 K, whereas theC‐Alaser emission ceases under these conditions.

 

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