The model HOLCROSS ion source is designed for the production of high‐current and brightness ion beams for application in ion implantation and particle accelerator injection. This ion source has been designed to deliver an ion beam up to a maximum of 30 mA at an energy of 30 keV and will serve as an injector to a radio frequency accelerator. This ion source is equipped with an additional cross‐type hollow cathode system placed between the auxiliary plasma generator and the extractor. A negative voltage is applied to the cathode so that dependent low pressure gas discharge (DGD) is observed. High homogeneity and emission density of the plasma (50 mA/cm2) in the extraction region and multiaperture extraction are advantages of this version. The voltage of the DGD has the value 300–1200 V depending on the auxiliary discharge current so the plasma chemical reactions in the extraction region may be controlled. A description of the source is given, together with some recent results.