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High‐temperature annealing behavior of &mgr;&tgr; products of electrons and holes ina‐Si:H

 

作者: F. Wang,   R. Schwarz,  

 

期刊: Journal of Applied Physics  (AIP Available online 1992)
卷期: Volume 71, issue 2  

页码: 791-795

 

ISSN:0021-8979

 

年代: 1992

 

DOI:10.1063/1.351345

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The mobility‐lifetime products of electrons and holes [(&mgr;&tgr;)eand (&mgr;&tgr;)h] in undoped hydrogenated amorphous silicon samples have been studied by photoconductivity and ambipolar diffusion length measurements. The density of dangling bondsNdin the samples is changed over a range of 3×1015–2×1018cm−3by annealing at high temperatures.Ndand the Urbach tail slopeEovhave been determined by the constant photocurrent method. In addition, the optical gap, the activation energy of dark conductivity, and the exponent governing the intensity dependence of &sgr;pchave been measured. The results show that there is a correlation betweenNdandEovwhich is consistent with equilibrium theory. (&mgr;&tgr;)eand (&mgr;&tgr;)hchange in quite different ways asNdincreases, namely, (&mgr;&tgr;)edecreases as a linear function of the inverse ofNd. However, (&mgr;&tgr;)hremains almost constant whenNd≤5×1016cm−3, then decreases fast for higherNd. The asymmetric dependence of transport properties of electrons and holes onNdsuggests that for electrons recombination through dangling bond states is dominant; but, for holes, recombination mainly proceeds through deep band tail states, especially whenNdis relatively low.

 

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