Ion induced silicide formation in niobium thin films
作者:
S. Matteson,
J. Roth,
M.-A. Nicolet,
期刊:
Radiation Effects
(Taylor Available online 1980)
卷期:
Volume 49,
issue 1-3
页码: 157-160
ISSN:0033-7579
年代: 1980
DOI:10.1080/00337578008243085
出版商: Taylor & Francis Group
数据来源: Taylor
摘要:
MeV4He backscattering and x-ray diffraction analysis were used to examine the intermixing of niobium thin films on single crystal silicon during28Si+ion bombardment. The ambient temperature dependence of the intermixing is reported. The dependence cannot be explained by either radiation-enhanced diffusion or cascade mixing alone. The silicides. NbSi2and Nb5Si3, were both observed. Silicide growth was found to be proportional to the square root of the fluence for the case in which the ion range exceeds the film thickness.
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