An electron beam column was designed and was used in experiments for a 50×50 mm2deflection area. The column consists of a condenser lens, a combined focusing and double deflection system, and dynamic focus and astigmatism coils. The system successfully reduced deflective coma and transverse chromatic aberrations that could not be dynamically corrected. The dynamic coils adroitly corrected not only inherent aberrations in the column but also irregular ones produced by misalignment of the beam, column manufacturing error, and so forth. A LaB6electron gun was employed at a brightness of 5×105A/cm2sr at 20 kV beam energy. After correction, the Gaussian beam diameter was less than 1.5 μm at 100 nA beam current in the deflection area. Test patterns including 4 μm minimum linewidths were exposed onto PMMA resist to demonstrate beam performance. Standard deviations (3σ) of the linewidths were 0.56 and 0.42 μm in thexandydirections, respectively.