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Low temperature photoluminescence measurements on boron- and hydrogen-implanted 6H–SiC

 

作者: C. Peppermu¨ller,   R. Helbig,   K. Rottner,   A. Scho¨ner,  

 

期刊: Applied Physics Letters  (AIP Available online 1997)
卷期: Volume 70, issue 8  

页码: 1014-1016

 

ISSN:0003-6951

 

年代: 1997

 

DOI:10.1063/1.118468

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We investigated the low temperature(T<2K) photoluminescence (LTPL) emission of 6H–SiC samples after implantation of either boron or boron together with hydrogen. After implantation of boron and annealing at1700 °C, we detected new LTPL emission at 4205 Å. After implantation of hydrogen into the boron-implanted and annealed sample, another LTPL emission at 4183 Å appeared. We interpret two additional peaks as vibrational modes of the 4183 Å emission with energies of 86 and 118 meV. ©1997 American Institute of Physics.

 

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