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Photodeposition of GeO2‐SiO2glass and application to planar optical waveguides

 

作者: A. Tate,   K. Jinguji,   T. Yamada,   N. Takato,  

 

期刊: Journal of Applied Physics  （AIP Available online 1986）
卷期: Volume 59, issue 3  

页码: 932-936

 

ISSN:0021-8979

 

年代: 1986

 

DOI:10.1063/1.336565

 

出版商: AIP

 

数据来源: AIP

 

摘要:

First reports on the characteristics and applications of GeO2‐SiO2glass films formed by laser‐induced chemical vapor deposition (CVD) are presented. At a low temperature (200–300 °C), solid solutions of ternary compounds can be obtained by laser‐induced CVD. It is shown that these GeO2‐SiO2ternary films were applicable to planar optical waveguides.

 

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