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Dislocation Mobility in Crystals

 

作者: J. J. Gilman,  

 

期刊: Journal of Applied Physics  (AIP Available online 1965)
卷期: Volume 36, issue 10  

页码: 3195-3206

 

ISSN:0021-8979

 

年代: 1965

 

DOI:10.1063/1.1702950

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Reaction‐rate theory is applied to dislocation motion and it is shown that when the activated complex is allowed two degrees of freedom, the activation energy is inversely proportional to the applied stress, so the dislocation velocity,vdis related to the applied shear stress, &tgr; by a relation of the form:v=v0e−D/&tgr;, wherev0is the terminal velocity andDis called the characteristic drag stress. This relation is obeyed by LiF, Ge, NaCl, W, and possibly Fe−3% Si.The observed dependences of dislocation velocities on point defect concentrations and temperature are also predicted.Two classes of crystals are considered. Those in which drag is caused mainly by point defects; and those in which the intrinsic structure (chemical bonds) causes the drag.

 

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